Title | Laser crystallization of compensated hydrogenated amorphous silicon thin films |
Publication Type | Journal Article |
Year of Publication | 2006 |
Authors | Saleh, R., N. H. Nickel, and K. V. Maydell |
Journal | Journal of Non-Crystanlline Solids |
Volume | 352 |
Pagination | 1003-1007 |
Date Published | JUN 15 |
Type of Article | Proceedings Paper |
ISSN | 0022-3093 |
Keywords | crystal growth, Lasers, Raman spectroscopy, silicon |
Abstract | Raman backscattering and hydrogen effusion measurements were performed on compensated, highly P- and B-doped laser crystallized polycrystalline silicon. From hydrogen effusion spectra the hydrogen chemical potential, mu(H), is determined as a function of hydrogen concentration, which can be related to the hydrogen density-of-states distribution. Interestingly, hydrogen bonding is affected by doping of the amorphous starting material. Below the hydrogen transport states, four peaks are observed in the hydrogen density-of-states at 2.0, 2.2, 2.5 and 2.8 eV. The latest peak is not observed in B-doped samples. The hydrogen effusion results will be correlated with the results obtained from Raman backscattering measurements. (c) 2006 Elsevier B.V. All rights reserved. |
URL | http://dx.doi.org/10.1016/j.jnoncrysol.2005.10.067%7D |
DOI | 10.1016/j.jnoncrysol.2005.10.067 |