Planar microwave devices fabricated by ion #x2010;implantation patterning of high #x2010;temperature superconductors

TitlePlanar microwave devices fabricated by ion #x2010;implantation patterning of high #x2010;temperature superconductors
Publication TypeJournal Article
Year of Publication1996
AuthorsDeGroot, D. C., D. A. Rudman, K. Zhang, Q. Y. Ma, H. Kato, and N. A. F. Jaeger
JournalApplied Physics Letters
Volume69
Pagination2119 -2121
Date Publishedsep.
ISSN0003-6951
KeywordsBARIUM OXIDES, COPPER OXIDES, HIGH-TC SUPERCONDUCTORS, ion implantation, MICROWAVE POWER TRANSMISSION, SUPERCONDUCTING FILMS, waveguides, YTTRIUM OXIDES
Abstract

We have applied ion #x2010;implantation inhibit patterning as a new method of fabricating low #x2010;loss microwave transmission lines in high #x2010;temperature superconductor thin films. To determine the effectiveness of this technique, we fabricated coplanar waveguide transmission lines in YBa2Cu3O7- #x3b4; thin films that had been deposited on LaAlO3 substrates using pulsed laser deposition. Microwave characterizations of these lines are compared to a reference line fabricated with conventional ion milling. At 76 K and 12 GHz, the attenuation constants of the ion #x2010;implanted transmission lines are approximated 0.02 dB/mm, and the overall loss response is indistinguishable from that of the ion #x2010;milled device. #xa9; 1996 American Institute of Physics.

URLhttp://dx.doi.org/10.1063/1.116899
DOI10.1063/1.116899

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